C12000 is a high-purity electrolytic copper, also known as ETP copper (Electrolvtic Tough Pitch Copper), which consists of at least 99.9% copper and some impurities (up to 0.04%) such as oxygen and sulfur. It is composed of at least 99.9% copper and a number of impurities (up to 0.04%) such as oxygen, iron and sulfur.ETP copper is one of the most commonly used copper alloys in the manufacture of semiconductor devices, wires and cables, electronic components, automotive parts, and HVACR equipment parts.
C12000 is very conductive and machinable and has high corrosion resistance and storage capacity. In addition, C12000 is also used in architectural and artistic applications such as roofing, tanks, boilers and sculptures. Its main characteristics are high conductivity, good workability, excellent corrosion resistance and storage power.
Element | Minimum (%) | Maximum (%) |
---|---|---|
Copper (Cu) | 99.90 | – |
Oxygen (O) | – | 0.04 |
Phosphorus (P) | – | 0.015 |
Sulfur (S) | – | 0.015 |
Iron (Fe) | – | 0.05 |
Lead (Pb) | – | 0.005 |